Article ID | Journal | Published Year | Pages | File Type |
---|---|---|---|---|
9672153 | Microelectronics Reliability | 2005 | 6 Pages |
Abstract
The degradation of the electrical performance of thin gate oxide fully depleted SOI n-MOSFETs and its dependence on the radiation particles are investigated. The transistors are irradiated with 7.5-MeV protons and 2-MeV electrons at room temperature without bias. The shift of threshold voltage and the coupling effect with the degraded opposite gate are clarified. A remarkable reduction of the floating body effects is observed after irradiation. The degradation of the extracted parameters is discussed by a comparison with the damage coefficients.
Related Topics
Physical Sciences and Engineering
Computer Science
Hardware and Architecture
Authors
K. Hayama, K. Takakura, H. Ohyama, S. Kuboyama, S. Matsuda, J.M. RafÃ, A. Mercha, E. Simoen, C. Claeys,