Article ID Journal Published Year Pages File Type
9672304 Microelectronics Reliability 2005 4 Pages PDF
Abstract
Tantalum oxide (Ta2O5) is widely used for MIM (Metal-Insulator-Metal) capacitor owing of its high dielectric constant. This work examines current-voltage and capacitance-voltage characteristics in the 5 K-300 K temperature range. Working at low temperature was chosen in order to freeze trapping mechanisms of the MIM capacitor. The curvature of C-V characteristics radically changes from 5 K to 300 K. The capacitance variation under voltage at 50 K and below can be investigated using the Langevin theory. From this model the permanent dipole moment and the number of dipoles have been extracted. From Poole-Frenkel identification curves, activation energy around 0.20 eV and a dielectric constant of 26 were found for positive polarisation. However, conduction mechanisms cannot be reduced to strick Poole-Frenkel modelling.
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Physical Sciences and Engineering Computer Science Hardware and Architecture
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