Article ID | Journal | Published Year | Pages | File Type |
---|---|---|---|---|
542140 | Microelectronics Journal | 2009 | 9 Pages |
Abstract
The design of CAD tools for nanofabrics involves new challenges not encountered with conventional design flow used for CMOS technology. In this paper, we propose to define a new framework able to help the designer to map an application on a wide range of emerging nanofabrics. Our proposal is based on a variety of models that capture as well as isolate the differences between these fabrics. This tool supports the design flow starting from behavioral description up to final layout. It integrates fault-tolerant techniques and fabric-related density transformations with more conventional design automation techniques. After an overview of common requirements, physical models, and associated techniques, a case study in the context of NASIC fabrics is used to illustrate some of the concepts.
Related Topics
Physical Sciences and Engineering
Computer Science
Hardware and Architecture
Authors
Catherine Dezan, Ciprian Teodorov, Loïc Lagadec, Michael Leuchtenburg, Teng Wang, Pritish Narayanan, Andras Moritz,