Article ID | Journal | Published Year | Pages | File Type |
---|---|---|---|---|
10364055 | Microelectronic Engineering | 2005 | 8 Pages |
Abstract
RF plasma based mitigation has been studied as an improved debris mitigation scheme for extreme ultraviolet (EUV) sources. The RF plasma ionizes sputtered neutral debris and, when used in conjunction with a collimator (also known as a foil trap), inhibits that debris from reaching the collector optics. An ionization fraction of 61 ± 3% has been measured. In addition, increased scattering of the ion component of the debris has led to a decrease in erosive flux reaching the diagnostics. Results from in situ high-precision quartz crystal oscillators, ex situ surface characterization (Auger, XPS), and secondary plasma characterization is presented for a series of mitigation schemes, including a foil trap in conjunction with the RF plasma.
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Authors
E. Vargas López, B.E. Jurczyk, M.A. Jaworski, M.J. Neumann, D.N. Ruzic,