Wire-bonding process development for low-k materials

A 60-μm bond-pad-pitch wire-bonding process was developed using test dies with a SiO2 dielectric layer under aluminium pads, and was then fine-tuned for a low-k device using three types of gold wires with different mechanical properties. Bulk material hardness of the wires were characterised using a wire-bonding machine, the force applied and diameters of squashed free-air balls. It was found that stiffer wires needed higher ultrasonic-generator (USG) power than a softer wire to deform the ball after impact and achieve equivalent ball size and ball shear responses. Longer bond time was also needed for the low-k material than the SiO2 material, to overcome the energy loss due to the compliance of the low-k material. Pad damage on the low-k device was proportional to bulk material hardness. The soft 4N (99.99% purity) wire required lower USG power to achieve the bonding specification, and was the most suitable wire to be used in wire bonding of the low-k device.