Article ID | Journal | Published Year | Pages | File Type |
---|---|---|---|---|
4970934 | Microelectronic Engineering | 2017 | 5 Pages |
â¢Methylammonium lead iodide thin film nanoimprinting approach is proposed.â¢V-groove nanostructures are transferred to the photoactive material via Pulsed-NIL.â¢The technique allows to perform the step in less than 1 s.â¢The preliminary trials show the possibility to scale up the process.
We report the nanopatterning of the methylammonium lead iodide (MAPbI3) perovskite, a polycrystalline hybrid organic-inorganic semiconductor with very promising perspectives for photovoltaic and optoelectronic applications. Nanopatterning of MAI is obtained via Pulsed-NIL technology, an ultrafast version of the thermal nanoimprint lithography (NIL) based on stamps with integrated heaters. By Pulsed-NIL we were able to replicate onto the hybrid perovskite structures with details at the sub-100Â nm scale, in spite of its crystalline nature. This work shows a new possibility for the exploitation of organo-metal halide perovskites in optoelectronic devices with more complex architectures than just planar films.
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