| Article ID | Journal | Published Year | Pages | File Type |
|---|---|---|---|---|
| 4971122 | Microelectronic Engineering | 2016 | 8 Pages |
Abstract
Acceleration of e-beam lithography by minimized resist exposure for large scale nanofabrication177
Related Topics
Physical Sciences and Engineering
Computer Science
Hardware and Architecture
Authors
Jie Deng, Ten It Wong, Ling Ling Sun, Chenggen Quan, Xiaodong Zhou,