| Article ID | Journal | Published Year | Pages | File Type |
|---|---|---|---|---|
| 539062 | Microelectronic Engineering | 2015 | 4 Pages |
•The silicon dioxide (SiO2) films coated on plastic substrate are used as the water barrier layer by liquid phase deposition method.•After permeation test, the OH group is slightly observed in the Fourier transform infrared (FTIR) spectra.•The requirement of a water barrier layer of flexible organic light-emitting diode (FOLED) can be obtained.
In this study, the silicon dioxide (SiO2) films coated on plastic substrate are used as the water barrier layer by liquid phase deposition method. The result revealed that the maximum refraction index is up to 1.43 after undergoing N2 ambient annealing for 2 h. After permeation test, the OH group is slightly observed in the Fourier transform infrared (FTIR) spectra, indicating that the LPD-SiO2 film could suffice for the requirement of a water barrier layer of flexible organic light-emitting diode (FOLED).
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