| Article ID | Journal | Published Year | Pages | File Type |
|---|---|---|---|---|
| 539398 | Microelectronic Engineering | 2014 | 8 Pages |
•Defects rate of template releasing process in nanoimprint is investigated.•Novel releasing method named push back method is proposed.•The push buck method is good releasing property.•The mechanism of the push back method is investigated.
Various template-releasing methods, including a newly proposed novel method for nanoimprint lithography, are examined and evaluated in terms of defect rates for line and pillar patterns. The newly proposed method, called the push-back method, shows excellent releasing performance. In the push-back method, a template is repeatedly pushed up and back to a resist pattern. We evaluated defect rates after template releasing for various methods using a newly developed tool controlled in multiple axes.
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