Article ID | Journal | Published Year | Pages | File Type |
---|---|---|---|---|
539742 | Microelectronic Engineering | 2010 | 4 Pages |
This paper proposes two metal patterning processes. In each process, nanoimprint lithography (NIL) is used with commercialized particle-based silver nanoink which has appropriate properties for NIL. One process is a direct NIL process with a polydimethylsiloxane (PDMS) stamp; the other is a combined NIL and lift-off process. The direct NIL process is executed by using a xylene-absorbed PDMS stamp to decrease the curing time and minimize the residuals. A flexible PDMS stamp can also be wrapped around a quartz cylinder and used as a roll stamp to enlarge the patterned area. The direct NIL process successfully produced silver line patterns in the range of 200–300 nm, and the combined NIL and lift-off process successfully produced silver line patterns in the range of 15–60 nm.