| Article ID | Journal | Published Year | Pages | File Type |
|---|---|---|---|---|
| 539760 | Microelectronic Engineering | 2010 | 4 Pages |
Abstract
The fabrication of photomask by fountain-pen nanolithography (FPN) with silver nanoparticles ink is studied. The FPN, a kind of pen-type nanolithography technique, enables on-demand patterning of micro-meter size at large area. Firstly preparation of silver nanoparticles ink and patterning condition by FPN were investigated. Then the photomask was fabricated by the FPN with the prepared ink. And photolithography process with the photomask was tried. The result indicates that the pattern made by the FPN behaved as a photomask.
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Authors
Miki Onoue, Hirobumi Ushijima,