Article ID | Journal | Published Year | Pages | File Type |
---|---|---|---|---|
539772 | Microelectronic Engineering | 2010 | 4 Pages |
Abstract
Soft ultraviolet nanoimprint lithography is a cost-effective and versatile technique for the transfer of nano-scaled patterns to various surfaces. Here, we report on the fabrication of sub-micron square pillar arrays in epitaxial Ba0.7Sr0.3TiO3 ceramic films, using a combination of nanoimprint lithography and inductively coupled plasma etching techniques. Based on a similar approach we have also succeeded in preparing positive (direct) and negative (inverse) replicas of silicon master molds. Such a generic process could find application in various materials.
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Authors
K.L. Jim, F.K. Lee, J.Z. Xin, C.W. Leung, H.L.W. Chan, Y. Chen,