| Article ID | Journal | Published Year | Pages | File Type |
|---|---|---|---|---|
| 539934 | Microelectronic Engineering | 2007 | 5 Pages |
In this study, the optimum process parameters and the influences of their process parameters were investigated for indium tin oxide–chemical mechanical polishing (ITO–CMP) with the sufficient removal rate and the good planarity. And then, the optical property such as transmittance and absorption efficiency, and the electrical characteristics such as sheet resistance, carrier density and Hall mobility were discussed in order to evaluate the possibility of CMP application for the organic light emitting display (OLED) device using an ITO film. Light transmission efficiency and current–voltage characteristics of ITO thin film were improved after CMP process using optimized process parameters compared to that of as-deposited thin film before CMP process.
