| Article ID | Journal | Published Year | Pages | File Type |
|---|---|---|---|---|
| 540047 | Microelectronic Engineering | 2007 | 4 Pages |
Abstract
A study has been completed to investigate the imaging performance with the industry standard 6% attenuated phase shift mask. Several test structures were used to investigate the effects on line edge roughness (LER) based on the polarization state of the illuminator. The use of a high NA (>1 NA) immersion exposure system was employed to study the imaging characteristics.
Related Topics
Physical Sciences and Engineering
Computer Science
Hardware and Architecture
Authors
Arjan Verhappen, Jan Pieter Kuijten, Will Conley, Martin Chaplin, Paul van der Vleuten, Stephan van der Goor, Lloyd Litt, Bryan Kasprowicz,