Article ID | Journal | Published Year | Pages | File Type |
---|---|---|---|---|
540071 | Microelectronic Engineering | 2007 | 5 Pages |
Abstract
A process based on nanoimprint lithography is proposed to manufacture linear encoders with a pitch below 1 μm. A phase scale and a read head were manufactured by pattern transfer on silicon and glass, respectively. The process developed points out that this technology may be suitable for mass produced encoders with a very high resolution and/or accuracy in the nanoscale range.
Related Topics
Physical Sciences and Engineering
Computer Science
Hardware and Architecture
Authors
S. Merino, A. Retolaza, A. Juarros, S. Landis,