| Article ID | Journal | Published Year | Pages | File Type |
|---|---|---|---|---|
| 540076 | Microelectronic Engineering | 2007 | 5 Pages |
Abstract
We present results on the nanofabrication of high density patterns in SU-8 resist, based on nanoimprinting combined with UV curing. The temperature dependence of the imprinted depth was investigated. The SU-8 gratings were well resolved with high density, good uniformity and high aspect ratio. This was achieved at low temperature and low pressure. Some issues and possible solutions are discussed. The process should find broader applications such as in the manufacture of nanofluidic channels and nanophotonic structures.
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Authors
Xudi wang, Yifang Chen, Shahanara Banu, Hywel Morgan, Shaojun Fu, Zheng Cui,