| Article ID | Journal | Published Year | Pages | File Type |
|---|---|---|---|---|
| 540083 | Microelectronic Engineering | 2007 | 5 Pages |
Abstract
An improved mold fabrication process that utilizes toluene diluted polydimethylsiloxane (PDMS) as flexible mold material was developed. Various toluene concentrations and their implication on the pattern definition using the Soft UV-Nanoimprint process were analyzed and discussed. Dots with a resolution of 50 nm are well replicated and an excellent imprint homogeneity across a 4 in. wafer with one imprint step only is demonstrated.
Keywords
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Physical Sciences and Engineering
Computer Science
Hardware and Architecture
Authors
Namil Koo, Markus Bender, Ulrich Plachetka, Andreas Fuchs, Thorsten Wahlbrink, Jens Bolten, Heinrich Kurz,