| Article ID | Journal | Published Year | Pages | File Type |
|---|---|---|---|---|
| 540101 | Microelectronic Engineering | 2007 | 4 Pages |
Abstract
CD control in step & repeat UV-based nanoimprint lithography was investigated to determine effects of the physical contact between the template and the resist within each imprint. Over 100 fields were printed with a single template. For each field, a specific structure was located and four selected feature sizes were analyzed with SEM. In each case, the 3σ values were less than 9 nm. Negative effects of the printing process on CD control, such as a gradual increase in feature size due to accumulation of resist residue on the template over time, could not be observed. Constant feature sizes were maintained throughout all imprints performed with UV-based nanoimprint lithography.
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Authors
M. Otto, M. Bender, J. Zhang, A. Fuchs, T. Wahlbrink, J. Bolten, B. Spangenberg, H. Kurz,