3D structural templates for UV-NIL fabricated with gray-scale lithography

Templates with analog relief surface for UV-nanoimprint lithography are expected to imprint 3D optical elements or micro lens array with a single process cycle. An originally developed direct-writing technique is introduced as a dot density modulation, and template is prepared by a single process cycle with gray-scale lithography, instead of the conventional multi-step template fabrication process with height level segmentation. Fabrication of templates for a micro lens array with smooth 3D structure is demonstrated and actual nanoimprint performance is confirmed.