Article ID | Journal | Published Year | Pages | File Type |
---|---|---|---|---|
540105 | Microelectronic Engineering | 2007 | 4 Pages |
Abstract
Templates with analog relief surface for UV-nanoimprint lithography are expected to imprint 3D optical elements or micro lens array with a single process cycle. An originally developed direct-writing technique is introduced as a dot density modulation, and template is prepared by a single process cycle with gray-scale lithography, instead of the conventional multi-step template fabrication process with height level segmentation. Fabrication of templates for a micro lens array with smooth 3D structure is demonstrated and actual nanoimprint performance is confirmed.
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Physical Sciences and Engineering
Computer Science
Hardware and Architecture
Authors
Masaaki Kurihara, Makoto Abe, Katsutoshi Suzuki, Kouji Yoshida, Takeya Shimomura, Morihisa Hoga, Hiroshi Mohri, Naoya Hayashi,