Article ID Journal Published Year Pages File Type
540105 Microelectronic Engineering 2007 4 Pages PDF
Abstract

Templates with analog relief surface for UV-nanoimprint lithography are expected to imprint 3D optical elements or micro lens array with a single process cycle. An originally developed direct-writing technique is introduced as a dot density modulation, and template is prepared by a single process cycle with gray-scale lithography, instead of the conventional multi-step template fabrication process with height level segmentation. Fabrication of templates for a micro lens array with smooth 3D structure is demonstrated and actual nanoimprint performance is confirmed.

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Physical Sciences and Engineering Computer Science Hardware and Architecture
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