Article ID Journal Published Year Pages File Type
540122 Microelectronic Engineering 2007 4 Pages PDF
Abstract

Need for inorganic electron beam resist with higher sensitivity and resolution is indisputable. We have developed such a resist that also shows lower line edge roughness. It is pre-baked at 300 °C. By using 4 kV EB we have delineated 40 nm lines pattern and honeycomb structure Photonic crystal pattern.

Related Topics
Physical Sciences and Engineering Computer Science Hardware and Architecture
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