Article ID | Journal | Published Year | Pages | File Type |
---|---|---|---|---|
540122 | Microelectronic Engineering | 2007 | 4 Pages |
Abstract
Need for inorganic electron beam resist with higher sensitivity and resolution is indisputable. We have developed such a resist that also shows lower line edge roughness. It is pre-baked at 300 °C. By using 4 kV EB we have delineated 40 nm lines pattern and honeycomb structure Photonic crystal pattern.
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Physical Sciences and Engineering
Computer Science
Hardware and Architecture
Authors
Kenta Ogino, Jun Taniguchi, Shin-ichi Satake, Keisuke Yamamoto, Yoshiaki Ishii, Kiyoshi Ishikawa,