Fabrication and characterization of Co–Pt nanodot arrays by nanoimprint lithography and electrodeposition

Co–Pt nanodot arrays of 50 nm in diameter and 100 nm pitch were fabricated by nanoimprint lithography and electrodeposition process. A polymer mold used was replicated from a Si master mold with nanopatterns which were fabricated by EBL and ICP-RIE, where hydrophobic surface of these was achieved by FOTS coating. UV-NIL was successfully performed under pressures of 5 MPa for 5 min with an UV exposure time of 30 s, where the substrate was Ru (30 nm)/NiFe (10 nm)/Ta (5 nm)/Si (1 0 0). The size of patterns was measured at 53 nm in diameter, 25 nm in height, 100 nm in pitch. Finally, Co–Pt nanodot arrays were galvanostatically electrodeposited and characterized. The size and the composition of these arrays were measured to be 50 nm in diameter and 100 nm in pitch and Co-23.6 at.% Pt, respectively. According to MFM analysis, these arrays for the remnant states represent a single domain structure of perpendicular direction with a magnetic field, where a field of 15 kOe was applied perpendicular to the sample plane. These results show that for the Co–Pt dot arrays of 50 nm diameter perpendicular magnetic signal can be recorded and switched.