| Article ID | Journal | Published Year | Pages | File Type |
|---|---|---|---|---|
| 540614 | Microelectronic Engineering | 2010 | 4 Pages |
In this work, a high power continuous-wave (CW) Nd:YAG laser was used for thermal treatment of inkjet-printed Ag films – resulting in the elimination of organic additives (dispersant, binder, and organic solvent) in the Ag ink and annealing of Ag nano-particles. By optimizing laser parameters such as laser power and defocusing value, the laser energy can be totally converted into heat energy, which is used for thermal treatment of inkjet-printed Ag films. This results in the microstructure and the resistivity of the films to be controlled. We investigated the thermal diffusion mechanisms during laser annealing and the resulting microstructures. The impact of high power laser annealing on microstructures and electrical characteristics of inkjet-printed Ag films was compared to those of the films annealed by a conventional furnace annealing. Focused ion beam (FIB) channeling images show that the laser annealed Ag films have large columnar grains and a dense void-free structure, while furnace annealed films have much smaller grains and exhibit void formation. As a result, the laser annealed films have better electrical properties (low resistivity) compared to furnace annealed samples.
