Article ID | Journal | Published Year | Pages | File Type |
---|---|---|---|---|
540845 | Microelectronic Engineering | 2007 | 5 Pages |
Abstract
Micrographic features generated by electron beam lithography have been hot embossed in biaxially-oriented polypropylene (BOPP). Each micrographic element consisted of a sub-field of 30 × 30 μm with a specific configuration of symbols, lettering and graphics. The micrographic elements were integrated with arrays of diffractive gratings in the form of an optically variable device. A high quality embossing of various micrographic elements has been demonstrated in features with a linewidth dimension ⩾365 nm and depth ⩾255 nm. The replication of arrays of micrographic elements was achieved uniformly over an area of 20 × 20 mm in the BOPP film by embossing at a temperature of 130 °C.
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Physical Sciences and Engineering
Computer Science
Hardware and Architecture
Authors
Patrick W. Leech, Robert A. Lee, Brett A. Sexton, Fiona Smith,