Article ID | Journal | Published Year | Pages | File Type |
---|---|---|---|---|
540849 | Microelectronic Engineering | 2007 | 8 Pages |
Abstract
This work reports the results on the influence of gas mixing ratio, gas pressure (0.26–3.3 Pa) and input power (400–900 W) on the Cl2/Ar plasma parameters in the planar inductively-coupled plasma reactor. The investigation combined plasma diagnostics by Langmuir probe and quadrupole mass-spectroscopy with plasma modelling given by the self-consistent global (0-dimensional) model with Maxwellian approximation for the electron energy distribution function. It was shown that, for the given range of experimental conditions, the model showed an outstanding agreement with the experiments and provided the near-to-adequate data on kinetics of plasma active species, their densities and fluxes.
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Authors
A.M. Efremov, Gwan-Ha Kim, Jong-Gyu Kim, A.V. Bogomolov, Chang-Il Kim,