Article ID | Journal | Published Year | Pages | File Type |
---|---|---|---|---|
540901 | Microelectronic Engineering | 2006 | 11 Pages |
Abstract
Intensive efforts to develop LEEPL tools and to build the infrastructure supporting LEEPL technology have been made since the concept of LEEPL was first published in 1999. As a result, LEEPL has been recently gaining recognition as a potential solution for future lithography in semiconductor industry. Here, LEEPL's present status and future prospects are presented on the basis of these efforts.
Keywords
Related Topics
Physical Sciences and Engineering
Computer Science
Hardware and Architecture
Authors
Takao Utsumi,