| Article ID | Journal | Published Year | Pages | File Type |
|---|---|---|---|---|
| 540934 | Microelectronic Engineering | 2006 | 4 Pages |
Abstract
We present a combined nanoimprint and photolithography (CNP) process for nano-size patterning to greatly simplify conventional ultraviolet nanoimprint lithography. The mold is a key component for precise patterning with CNP, and a novel hybrid mask mold with SiO2 interlayer and hydrophobic agent treatment is suggested for easy detachment after imprinting. This allows a very simple process to get a complete pattern transfer without any defects.
Related Topics
Physical Sciences and Engineering
Computer Science
Hardware and Architecture
Authors
Kanghun Moon, Banglim Choi, In-Sung Park, Sunghun Hong, Kihyun Yang, Heon Lee, Jinho Ahn,