| Article ID | Journal | Published Year | Pages | File Type |
|---|---|---|---|---|
| 540948 | Microelectronic Engineering | 2006 | 4 Pages |
Abstract
Template fabrication is one of the crucial issues in nanoimprint lithography. In this paper three different multilayer stamp concepts are compared that allow the imprinting of high resolution pattern on wafer scale with one imprint step only. Fabrication recipes as well as an analysis of local and global deformation, resolution and area homogeneity in an UV–NIL process are given. Advantages and disadvantages of the concepts are discussed.
Related Topics
Physical Sciences and Engineering
Computer Science
Hardware and Architecture
Authors
Ulrich Plachetka, Markus Bender, Andreas Fuchs, Thorsten Wahlbrink, Thomas Glinsner, Heinrich Kurz,