Low energy electron beam microcolumn lithography

A compact sized low energy microcolumn system has been developed for mask-less lithography application. The microcolumn has high throughput capabilities as well as high resolution using arrayed microcolumn structures. A number of arrayed microcolumn structures have been studied based on single column modules, monolithic column module, and wafer-scale column module. In this paper, a review of microcolumn studies and recent results of sub-60 nm line patterning in advanced low energy microcolumn operation is presented.