| Article ID | Journal | Published Year | Pages | File Type |
|---|---|---|---|---|
| 541490 | Microelectronic Engineering | 2009 | 4 Pages |
Abstract
This paper describes the development of a LPP EUV source using a CO2 laser with tin droplet targets. Burst power of 100 W and average power of 25 W has been achieved. Collector mirrors have been fabricated with >50% reflectivity and show stable EUV images. Multiple debris mitigation techniques preserve mirror reflectivity. Manufacturing of the first production systems is in progress.
Related Topics
Physical Sciences and Engineering
Computer Science
Hardware and Architecture
Authors
Nigel R. Farrar, David C. Brandt, Igor V. Fomenkov, Alex I. Ershov, Norbert R. Bowering, William N. Partlo, David W. Myers, Alexander N. Bykanov, Georgiy O. Vaschenko, Oleh V. Khodykin, Jerzy R. Hoffman, Christopher P. Chrobak,