| Article ID | Journal | Published Year | Pages | File Type |
|---|---|---|---|---|
| 541500 | Microelectronic Engineering | 2009 | 4 Pages |
Abstract
This paper experimentally demonstrates that a quantitative description of focused ion beam (FIB) milling (at least for several 3D profiles with inclination not higher than 45°) can be done by means of an isotropic local etching model. Specific characteristic of this model is that it does not account for re-deposition.The paper also presents IonRevSim – Software developed specifically for data preparation and prediction of the shape of the FIB machined structures. Those functions and their operating modes are discussed here in detail and FIB experimental results are provided to verify the algorithms embedded in the software.
Related Topics
Physical Sciences and Engineering
Computer Science
Hardware and Architecture
Authors
A. Svintsov, S. Zaitsev, G. Lalev, S. Dimov, V. Velkova, H. Hirshy,