| Article ID | Journal | Published Year | Pages | File Type |
|---|---|---|---|---|
| 541506 | Microelectronic Engineering | 2009 | 4 Pages |
Abstract
The imaging capability of a new spatial light modulator, (SLM), a custom MEMS device is presented. Low k1 factor aerial image measurements show the suitability of the SLM device for a variety of uses including optical maskless lithography (OML) applications.Collaborating with ASML partner companies, a fully programmable 11-million micro-mirror SLM device was designed, fabricated, and tested. Innovative MEMS manufacturing techniques were developed to fabricate the very large number of micro-mirrors on the underlying mixed-signal CMOS control circuitry. The individual eight-micron square mirrors were designed to support conventional, attenuated, and alternating phase-shift lithography.
Keywords
Related Topics
Physical Sciences and Engineering
Computer Science
Hardware and Architecture
Authors
John Lauria, Ronald Albright, Olga Vladimirsky, Maarten Hoeks, Roel Vanneer, Bert van Drieenhuizen, Luoqi Chen, Luc Haspeslagh, Ann Witvrouw,