Article ID Journal Published Year Pages File Type
541529 Microelectronic Engineering 2009 4 Pages PDF
Abstract

Transparent polymers are considered as alternative low-cost mold materials in UV nanoimprint lithography (UV-NIL). Here, we demonstrate a nanoimprint process with molds made of rigid polymers novel for this application. These polymer molds are found to show high performance in the patterning with UV-NIL. Sub-50 nm structures were fabricated with this process.

Related Topics
Physical Sciences and Engineering Computer Science Hardware and Architecture
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