Article ID | Journal | Published Year | Pages | File Type |
---|---|---|---|---|
541529 | Microelectronic Engineering | 2009 | 4 Pages |
Abstract
Transparent polymers are considered as alternative low-cost mold materials in UV nanoimprint lithography (UV-NIL). Here, we demonstrate a nanoimprint process with molds made of rigid polymers novel for this application. These polymer molds are found to show high performance in the patterning with UV-NIL. Sub-50 nm structures were fabricated with this process.
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Authors
Sandra Gilles, Matthias Meier, Michael Prömpers, Andre van der Hart, Carsten Kügeler, Andreas Offenhäusser, Dirk Mayer,