Fabrication and validation of fused silica NIL templates incorporating different length scale features

A cost effective methodology for pattering of Nano Imprint Lithography (NIL) templates incorporating different length scale features is proposed. The approach relies on selecting the optimum processing window of different technologies for cost effective micro- and nano-patterning. Very promising results were obtained when first fused silica templates were structured by F2 laser ablation at 157 nm. It was demonstrated that nano-scale features and complex 3D micro-scale features could be machined with a Focused Ion Beam (FIB) over the existing topography produced by laser ablation. Thus, a large area (up to several square centimeters) of the NIL templates is easily patterned with micro- and even meso-scale features by laser ablation while nano- and micro-scale features could be introduced locally by FIB machining. Through S-FIL process such templates were validated and the nano- and micro-structures were accurately replicated in one imprinting step.