Article ID | Journal | Published Year | Pages | File Type |
---|---|---|---|---|
543027 | Microelectronic Engineering | 2012 | 5 Pages |
Molecular dynamics simulations were performed to elucidate the mechanisms of deformation in bi-crystal Al thin films with twin boundaries subjected to the nanoimprint process. The effects of stamp spacing on deformation behavior and the mechanical response of the imprinted material were examined. Simulation results indicated that dislocation activity and dislocation–TB interaction are two plastic deformation modes in bi-crystal Al thin films. The results demonstrated that the stamp spacing has significant influence on the dislocation–TB interaction during the nanoimprint process.
Graphical abstractFigure optionsDownload full-size imageDownload as PowerPoint slideHighlights► We study nanoimprint on Al thin film with twin boundary by atomistic simulation. ► Dislocation–TB interaction is an important deformation mode of imprinted material. ► Stamp spacing has strong influence on deformation behavior and nanoimprint results.