| Article ID | Journal | Published Year | Pages | File Type |
|---|---|---|---|---|
| 543244 | Microelectronic Engineering | 2009 | 4 Pages |
Abstract
High ordered nano-sphere array patterns on Si substrate were fabricated using nanoimprint lithography. First, using hot embossing method, poly vinyl chloride (PVC) based polymer replica template was duplicated from original high ordered nano-sphere array patterns, which was fabricated by evaporation method. The monolayer transferring condition can be achieved by varying hot embossing pressure. Then, through UV nanoimprint lithography with the replicated polymer template, imprinted patterns, which has high ordered nano-sphere array patterns, was successfully fabricated on Si and flexible PET substrate.
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Authors
Sung-Hoon Hong, Byeong-Ju Bae, Jae-Yeon Hwang, Seon-Yong Hwang, Heon Lee,