Large area pattern replication by nanoimprint lithography for LCD–TFT application

Nanoimprint lithography is a high-throughput, low-cost, non-conventional lithographic method for fabricating micro/nanoscale patterns. In this study, we will present recent achievement in developing nanoimprint lithography for LCD–TFT fabrication. We fabricated metal gate for LCD–TFT with imprinting process. First, mold is pressed into a thin resist cast on a Cr layer which is deposited on a glass substrate. And the pressed resin is exposed to UV for curing, followed by demolding process. To acquire metal gate for LCD–TFT, subsequent process such as RIE with O2 Plasmas, wet etching of Cr and striping of remained resin is followed. Finally, the fabricated metal gate has 3.5 μm level width, 97% uniformity overall on 1G size in a single imprint. Herewith nanoimprint lithography can substitute conventional photolithography steps in LCD–TFT process. Also it is expected that large area fine pattering such as functional optical films and PCBs could be effectively produced by nanoimprint process.