| Article ID | Journal | Published Year | Pages | File Type |
|---|---|---|---|---|
| 543341 | Microelectronic Engineering | 2009 | 4 Pages |
Abstract
We have designed and fabricated a low-energy electron-beam lithography system based on a single column module (SCM) microcolumn. From the observed characteristics of the polymethyl methacrylate (PMMA) resist, the optimum conditions for the low-energy e-beam lithography have been determined. Fine line patterns on PMMA with line width less than 60 nm were obtained under optimized lithographic conditions. For the first time an aluminum photo-mask for optical lithography was created utilizing microcolumn lithography. Our results show that low-energy lithography systems have the potential to be used in high quality photo-mask fabrication processes.
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Physical Sciences and Engineering
Computer Science
Hardware and Architecture
Authors
H.S. Kim, S. Ahn, D.W. Kim, Y.C. Kim, S.J. Ahn,