Article ID | Journal | Published Year | Pages | File Type |
---|---|---|---|---|
543671 | Microelectronic Engineering | 2008 | 6 Pages |
Abstract
This study investigates various approaches to flare mitigation in EUVL. We evaluate the effectiveness of rule-based correction by defining a design where the critical dimension uniformity is used as a measure of the quality of the correction. We also describe the outcome of a model-based correction and the limits of this approach. Finally, we discuss the calculation of accurate full-chip flare maps which are required to implement a rule-based solution. Our results clearly indicate that it is possible to implement an effective flare variation compensation using rule-base correction with current EDA technology, provided that highly accurate full-chip flare maps having the required resolution are available.
Related Topics
Physical Sciences and Engineering
Computer Science
Hardware and Architecture
Authors
Insung Kim, Alan Myers, Lawrence S. Melvin III, Brian Ward, Gian Francesco Lorusso, Rik Jonckheere, Anne-Marie Goethals, Kurt Ronse,