193 nm interference nanolithography based on SPP

Large-area surface plasmon polariton interference lithography (LSPPIL) is a promising nano-fabrication technique for making periodic nano-patterns. In this paper, for reducing further the feature size of a lithography pattern, we propose to use 193 nm illumination wavelength in LSPPIL and replace the silver coating by tungsten. Theoretical analysis and preliminary numerical simulations indicate that 193 nm-LSPPIL can produce periodic patterns with a critical dimension as small as 30 nm with high contrast and enough long exposure depth. 193 nm interference nanolithography based on SPP has the potential to realize the 32 nm node periodic nano-structure manufacture.