Article ID | Journal | Published Year | Pages | File Type |
---|---|---|---|---|
543692 | Microelectronic Engineering | 2008 | 4 Pages |
Abstract
A two-dimensional, periodic array of nano-sized holes was fabricated in an indium tin oxide (ITO) layer, deposited onto a glass substrate with nanoimprint lithography. As a result of a thermally curing imprint process, hole array patterns with a diameter of 130 nm and a pitch of 520 nm were formed on the ITO surface with a near zero residual layer. After inductively coupled plasma etching process of ITO using the imprinted polymer pattern as an etch mask, a tapered-hole array pattern was fabricated on the ITO layer, thereby producing a prominent diffusion phenomenon in the near ultraviolet region.
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Authors
Kyeong-Jae Byeon, Seon-Yong Hwang, Heon Lee,