| Article ID | Journal | Published Year | Pages | File Type |
|---|---|---|---|---|
| 543706 | Microelectronic Engineering | 2008 | 4 Pages |
Abstract
The joined research activities on nanoimprint lithography (JRA-NIL) within a European Network of Excellence (ePIXnet) are described. The achievements are presented in three different exemplary applications.
Keywords
Related Topics
Physical Sciences and Engineering
Computer Science
Hardware and Architecture
Authors
U. Plachetka, A. Kristensen, S. Scheerlinck, J. Huskens, N. Koo, H. Kurz,