Article ID | Journal | Published Year | Pages | File Type |
---|---|---|---|---|
543728 | Microelectronic Engineering | 2008 | 4 Pages |
Abstract
We present two novel methods for the preparation of arbitrary microscale patterns of polymers on surfaces with pre-defined topography. While photosensitive polymers are used commonly together with optical lithography, the methods presented can be used for non-photostructurable polymers and where spin-coating cannot be performed. As demonstrator of the viability of the proposed fabrication process, they have been applied for the definition of hydrophobic barriers on a microfluidics network, which is dedicated to selectively dispense liquid to a spotting device consisting of 12 silicon microcantilevers.
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Physical Sciences and Engineering
Computer Science
Hardware and Architecture
Authors
C. Martin, A. Llobera, T. Leïchlé, G. Villanueva, A. Voigt, V. Fakhfouri, J.Y. Kim, N. Berthet, J. Bausells, G. Gruetzner, L. Nicu, J. Brugger, F. Perez-Murano,