Article ID Journal Published Year Pages File Type
544548 Microelectronic Engineering 2011 4 Pages PDF
Abstract

It was studied that FePt–Ta thin films prepared on MgO (1 0 0) buffer-layer by DC/RF magnetron co-sputtering have shown better magnetic properties and micro structural improvement. The Ta-doped FePt–Ta films indicate somewhat differences in micro structural ordering and the aspect of grain growth after annealing. With respect to magnetic property, the sample having 30% increased coercivity was obtained after a heat treatment at 700 °C. In particular the addition of Ta (5.5%) enhances the L10 ordering of FePt at relatively high temperature (above 500 °C).

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