Article ID | Journal | Published Year | Pages | File Type |
---|---|---|---|---|
544764 | Microelectronic Engineering | 2011 | 6 Pages |
Abstract
Nanoimprinted resist pre-forms were modified using thermal reflow. This post-processing of binary structures enabled us to generate lens-like 3-D structures with different shapes by time- and surface chemistry controlled spreading. The method was extended to feature dimensions down to 100 nm. Surfactant coated line nanostructures were found to be limited by a maximum aspect ratio for imprinted pre-forms. This powerful post-processing method can be used either directly as post-processing step in production or for the fabrication of 3-D stamp copies with the desired shapes.
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Hardware and Architecture
Authors
Helmut Schift, Christian Spreu, Arne Schleunitz, JaeJong Lee,