Article ID | Journal | Published Year | Pages | File Type |
---|---|---|---|---|
544819 | Microelectronic Engineering | 2010 | 5 Pages |
Abstract
An analytical drain current model for undoped (or lightly-doped) symmetric double-gate (DG) MOSFETs is presented. This model is based on the subthreshold leakage current in weak inversion due to diffusion of carriers from source to drain and an analytical expression for the drain current in strong inversion of long-channel DG MOSFETs, both including the short-channel effects. In the saturation region, the series resistance, the channel length modulation, the surface-roughness scattering and the saturation velocity effects were also considered. The proposed model has been validated by comparing the transfer and output characteristics with simulation and experimental results.
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Hardware and Architecture
Authors
A. Tsormpatzoglou, D.H. Tassis, C.A. Dimitriadis, G. Ghibaudo, G. Pananakakis, N. Collaert,