Article ID | Journal | Published Year | Pages | File Type |
---|---|---|---|---|
544821 | Microelectronic Engineering | 2010 | 4 Pages |
Abstract
In this study the metal–semiconductor–metal (MSM) structure ultraviolet (UV) photodetectors (PDs) based on MgxZn1−xO thin films were fabricated. The MgxZn1−xO thin films were grown on glass substrates by sol–gel method. The results show that the optical absorption has a blue shift and higher transmittance with increasing Mg dopant. The optical band gap were modified by 3.28–3.52 eV, which corresponded to x = 0 and x = 0.16. For a 10 V applied bias, the dark currents of the MgxZn1−xO MSM–PDs were 637 nA (x = 0) to 0.185 nA (x = 0.16) and showed good Schottky contacts. This UV–visible rejection ratio of the MgxZn1−xO UV PDs at x = 0, 0.16, 0.21 and 0.33 were 18.82, 35.36, 40.91 and 42.92, respectively.
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Authors
Tung-Te Chu, Huilin Jiang, Liang-Wen Ji, Te-Hua Fang, Wei-Shun Shi, Tian-Long Chang, Teen-Hang Meen, Jingchang Zhong,