| Article ID | Journal | Published Year | Pages | File Type |
|---|---|---|---|---|
| 544888 | Microelectronic Engineering | 2009 | 5 Pages |
Abstract
Ga2O3/GdGaO dielectric stacks have been grown on GaAs for MOSFETs. This paper highlights variations in the characteristics of GdGaO as the Gd flux, Ga2O flux and substrate temperature are changed. The growth rate, composition, crystallinity are discussed and the sheet resistance of final MOSFET structures are presented. The Gd compositional variation with depth is examined using Rutherford back scattering (RBS) and electron energy loss spectroscopy (EELS).
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Physical Sciences and Engineering
Computer Science
Hardware and Architecture
Authors
M. Holland, P. Longo, G.W. Paterson, W. Reid, A.R. Long, C.R. Stanley, A.J. Craven, I. Thayne, R. Gregory,