| Article ID | Journal | Published Year | Pages | File Type |
|---|---|---|---|---|
| 544915 | Microelectronic Engineering | 2009 | 5 Pages |
Abstract
An electrically curable resist has been developed that can make electric imprint lithography (EIL) a reality. The resist is composed of a diaryliodonium salt photo acid generator and a cycloaliphatic epoxy monomer. Its polymerization takes place when an electric potential is applied between a conductive imprint mold and a substrate which sandwich the resist. A proof-of-concept pattern transfer by EIL with a micron-scale resolution has been demonstrated.
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Physical Sciences and Engineering
Computer Science
Hardware and Architecture
Authors
Yong Sik Ahn, Yong Chen, H. Thomas Hahn,