A simple method for high yield fabrication of sharp silicon tips

A simple, high yield, method for the fabrication of sharp silicon tips is described. A triangular etch mask design is used to ensure that the tip forms with a single point. An anisotropic wet etch gives rise to a tip that continues to “self-sharpen” after the etch mask is released. The tip geometry comprises three converging {1 1 3} planes towards the apex with {3 1 3} planes forming at the base. The apex of each tip typically has a radius of curvature of <5 nm, which can be reduced to <2 nm by a subsequent oxide sharpening process. Tips of this kind have been successfully integrated into the fabrication of atomic force microscopy probes.