| Article ID | Journal | Published Year | Pages | File Type |
|---|---|---|---|---|
| 545262 | Microelectronic Engineering | 2006 | 5 Pages |
Abstract
Fabrication of multi-dimensional colloidal crystals on raised polymer substrate has been achieved by reversal nanoimprint technique. The combine effects of the feature size of the mold, particle diameter and imprinting steps control ordering of the colloidal particles. It is shown that using ‘Reversal nanoimprint lithography’, 3D colloidal particles can be selectively patterned on soft (polymer) substrates. Reversal nanoimprint lithography offers a relatively easy, fast and versatile method for patterning of colloidal particles.
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Authors
Wei Zhao, Yuebing Zheng, Hong Yee Low,